Delineation of platinum thin films, requiring high-temperature deposition

Sensors and Actuators, A: Physical

Volumn 101, Issue 3, 2002, Pages 358-363

  Thompson, Margarita P ^a   You, Ren ^b   Chang, Shih Chia ^a   Auner, Gregory W ^b   Mantese, Joseph V ^a  

^a DELPHI CORPORATION   (United States)

^b Wayne State University   (United States)

Author keywords

Delineation; High temperature deposition; Lift off; Platinum

Indexed keywords

CHROMIUM; ELECTRON BEAMS; HIGH TEMPERATURE OPERATIONS; LITHOGRAPHY; MAGNETRON SPUTTERING; MASKS; PHOTORESISTS; PLATINUM; SILICA; SILICON WAFERS; TITANIUM;

DELINEATION; HIGH-TEMPERATURE DEPOSITION; LIFT-OFF METHODS; PLATINUM THIN FILMS;

THIN FILMS;

EID: 0037202397     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00267-4     Document Type: Article

References (4)

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3. W. Kern, C.A. Deckert, in: J.L. Vossen, W. Kern (Eds.), Thin Film Processes, Academic Press, Orlando, FL, 1978, Chapter V-1, 471 pp.
4. C.J. Mogab, in: S.M. Sze (Ed.), VLSI Technology, McGraw-Hill, Taipei, Taiwan, 1983, Chapter 8, 304 pp.