Influences of the inclination of gratings on the alignment accuracies in moiré alignment systems

Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)

Volumn 139, Issue 2, 2002, Pages 46-51

  Furuhashi, Hideo ^a   Zhou, Lizhong ^b   Liu, Jingnan ^c   Matsuo, Akihito ^a   Uchida, Yoshiyuki ^a  

^a AICHI INSTITUTE OF TECHNOLOGY   (Japan)

^b YANGZHOU UNIVERSITY   (China)

^c Southeast University   (Japan)

Author keywords

Alignment; Alignment matching; Lithography; Moir signal; Simulation

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; MASKS; PHOTODIODES; PHOTOLITHOGRAPHY;

HIGH-PRECISION ALIGNMENT DEVICES;

VLSI CIRCUITS;

EID: 0037197564     PISSN: 04247760     EISSN: None     Source Type: Journal    
DOI: 10.1002/eej.1152     Document Type: Article

References (6)

1. Photolithographic mask alignment using moiré technique
2. Automatic alignment system for optical projection printing
3. A very high density alignment technique and precision thereof using moiré signals
4. Precision position control systems using moiré signals
5. Double diffraction in the Fresnel region
6. Optical ultramicrometer technique utilizing a composite diffraction grating