SCOPUS 정보 검색 플랫폼

Volumn 14, Issue 3, 2002, Pages

Erbium-doped silicon-rich silicon dioxide/silicon thin films fabricated by metal vapour vacuum arc ion source implantation

(7) Xu, Fei a Xiao, Zhisong b Cheng, Guoan c Yi, Zhongzhen c Zhang, Tonghe c Gu, Lanlan a Wang, Xun a

a FUDAN UNIVERSITY (China)

b CHINESE UNIVERSITY OF HONG KONG (Hong Kong)

c BEIJING NORMAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ERBIUM; LUMINESCENCE; QUENCHING; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICA; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

METAL VAPOUR VACUUM ARC ION SOURCE IMPLANTATION; SILICON RICH SILICON OXIDE THIN FILM;

ION IMPLANTATION;

EID: 0037185654 PISSN: 09538984 EISSN: None Source Type: Journal
DOI: 10.1088/0953-8984/14/3/103 Document Type: Letter

Times cited : (8)

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