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Journal of Photochemistry and Photobiology A: Chemistry

Volumn 150, Issue 1-3, 2002, Pages 257-265

Comparison of the processes induced by nitrogen dilution on the photodissociation of silane and disilane at 193 nm

(2) Aka, B a Boch, E b

a Ecole Normale Superieure d'Abidjan (Côte d’Ivoire)

b Centre de Recherches Nucleaires (France)

Author keywords

(Di)silane; Absorption; ArF laser; Dilution; Nitrogen; Photo CVD; Thermalization

Indexed keywords

DISILANE; NITROGEN; ORGANOSILICON DERIVATIVE; SILANE; SILICON; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL COMPOSITION; CHEMICAL REACTION; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; DILUTION; DISSOCIATION; GAS; KINETICS; MOLECULAR MODEL; PHOTODEGRADATION; PHOTOLYSIS; PRESSURE; ROOM TEMPERATURE;

EID: 0037178631 PISSN: 10106030 EISSN: None Source Type: Journal
DOI: 10.1016/s1010-6030(01)00660-8 Document Type: Article

Times cited : (4)

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