Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement

Journal of the American Chemical Society

Volumn 124, Issue 38, 2002, Pages 11284-11285

  Wilson, Jarod N ^a   Idriss, Hicham ^a  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; CATALYSIS; CHEMICAL REACTION KINETICS; CRYSTALLOGRAPHY; DIELECTRIC CONSTANT; QUANTUM YIELD; SEMICONDUCTOR;

ACETIC ACID; CATALYSIS; ETHANE; PHOTOCHEMISTRY; SEMICONDUCTORS; STRUCTURE-ACTIVITY RELATIONSHIP; SURFACE PROPERTIES; TITANIUM;

EID: 0037174376     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja027155m     Document Type: Article

References (12)

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