Influence of gap length and pressure on medium vacuum arc with Ti cathode in various ambient gases

Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 221-226

  Miyano, R ^a   Saito, T ^a   Takikawa, H ^a   Sakakibara, T ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Cathodic arc discharge; Deposition apparatus

Indexed keywords

ANODES; CATHODES; ELECTRIC POTENTIAL; IONIZATION OF GASES; STAINLESS STEEL; VACUUM DEPOSITED COATINGS;

CATHODIC ARC DISCHARGES;

ELECTRIC ARCS;

EID: 0037155431     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)90042-8     Document Type: Conference Paper

References (12)