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Thin Solid Films

Volumn 405, Issue 1-2, 2002, Pages 304-309

Structural and electrical properties of CoxC1-x nanogranular films prepared by pulsed filtered vacuum arc deposition

(7) Wang, H a Wong, S P a Li, W Q a Chiah, M F a Poon, C Y a Cheung, W Y a Ke, N a

a CHINESE UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Electrical resistance; Microstructure; Nanogranular films

Indexed keywords

AMORPHOUS FILMS; COBALT COMPOUNDS; DEPOSITION; ELECTRIC RESISTANCE; FILM PREPARATION; GRAIN BOUNDARIES; GRANULAR MATERIALS; METALLIC FILMS; MICROSTRUCTURE; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT PROPERTIES; VACUUM FURNACES; X RAY PHOTOELECTRON SPECTROSCOPY;

PULSED FILTERED VACUUM ARC DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 0037154935 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01771-0 Document Type: Article

Times cited : (15)

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