Simulation of interfacial metal electrodeposition: The electrochemical model and the numerical implementation

Journal of Physical Chemistry B

Volumn 106, Issue 46, 2002, Pages 11993-11999

  Sochnikov, Vassili S ^a   Efrima, Shlomo ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACIAL GROWTH;

COMPUTER SIMULATION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; GROWTH (MATERIALS); INTERFACES (MATERIALS);

ELECTRODEPOSITION;

EID: 0037153285     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp026436d     Document Type: Article

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