Synthesis and characterization of poly[(methyl methacrylate)-co-(methacrylic acid)] for a UV-sensitive aqueous base developable lithographic plate

Journal of Applied Polymer Science

Volumn 86, Issue 8, 2002, Pages 1829-1837

  Kiatkamjornwong, Suda ^a   Tessiri, Suteera ^a  

^a CHULALONGKORN UNIVERSITY   (Thailand)

Author keywords

Coatings; Copolymerization; Lithography; Photopolymerization; Resists

Indexed keywords

COPOLYMERS; DIFFERENTIAL SCANNING CALORIMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FREE RADICAL POLYMERIZATION; GEL PERMEATION CHROMATOGRAPHY; LITHOGRAPHY; MIXING; MONOMERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTORESISTS; SPIN COATING; SYNTHESIS (CHEMICAL);

BENZOYL PEROXIDE; POLYMETHYLMETHACRYLATE METHACRYLIC ACID; TRIMETHYLOL PROPANE ETHOXYLATED TRIACRYLATE; TRIPROPYLENE GLYCOL DIACRYLATE;

COPOLYMERIZATION;

COATINGS;

EID: 0037152990     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.11092     Document Type: Article

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