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Volumn 35, Issue 16, 2002, Pages 2032-2039

Microstructure of ion-irradiated stoichiometric NiAl intermetallic: A comparative image simulation and transmission electron microscopy study

(2) De Almeida, P a,b Victoria, M a

a EPFL (Switzerland)

b AGFA GEVAERT N V (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; COMPUTER SIMULATION; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; ELECTRON IRRADIATION; IMAGE ANALYSIS; ION BOMBARDMENT; NICKEL COMPOUNDS; OPTICAL RESOLVING POWER; OPTICAL TRANSFER FUNCTION; OSCILLATIONS; SINGLE CRYSTALS; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY;

DEFECT CLUSTERS; MICROGRAPHS;

SEMICONDUCTING INTERMETALLICS;

EID: 0037151384 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/35/16/319 Document Type: Article

Times cited : (3)

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