Effects of argon and hydrogen plasmas on the surface of silicon

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 453-456

  Umezu, I ^a   Kohno, K ^a   Aoki, K ^a   Kohama, Y ^a   Sugimura, A ^a   Inada, M ^a  

^a KONAN UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Defect; Photothermal deflection spectroscopy; Plasma; Silicon; Surface

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CRYSTAL DEFECTS; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; PLASMAS; SCHOTTKY BARRIER DIODES; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS;

PHOTOTHERMAL DEFLECTION SPECTROSCOPY; SURFACE DEFECTS;

SILICON WAFERS;

EID: 0037136214     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00170-7     Document Type: Article

References (7)