Dependence on substrate temperature of the film structure of μc-Si:H prepared by RF magnetron sputtering

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 409-413

  Kondo, J ^a   Tabata, A ^a   Kawamura, T ^a   Mizutani, T ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Infrared absorption; Microcrystalline silicon; RF magnetron sputtering; Sputtering; Substrate temperature; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; INFRARED RADIATION; MAGNETRON SPUTTERING; SILICON; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MICROCRYSTALLINE SILICON;

CRYSTALLINE MATERIALS;

EID: 0037136087     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00163-X     Document Type: Article

References (9)