Continuous particle self-arrangement in a long microcapillary

Advanced Materials

Volumn 14, Issue 22, 2002, Pages 1662-1666

  Wang, Hongzhi ^a   Li, Xianying ^a   Nakamura, Hiroyuki ^a   Miyazaki, Masaya ^a   Maeda, Hideaki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARITY; CHEMICAL VAPOR DEPOSITION; COLLOIDS; CONTACT ANGLE; CRYSTAL GROWTH; CRYSTAL STRUCTURE; EVAPORATION; HYDROPHOBICITY; IRRADIATION; MONOLAYERS; SCANNING ELECTRON MICROSCOPY; SEDIMENTATION; SELF ASSEMBLY; SILICA; SOLVENTS; SUSPENSIONS (FLUIDS);

MICROCAPILLARY;

MATERIALS SCIENCE;

EID: 0037132221     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(20021118)14:22<1662::aid-adma1662>3.0.co;2-%23     Document Type: Article

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