Reaction kinetics of cerium thin films with H2, O2 and H2O systems at 298 K

Journal of Alloys and Compounds

Volumn 330, Issue 332, 2002, Pages 498-501

  Hadano, M ^a   Urushihara, N ^a   Terada, S ^a   Katsuya, D ^a   Uchida, H ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

Cerium; Cerium hydride; Cerium hydroxide; Cerium oxide; Surface process of hydrogen

Indexed keywords

CERIUM THIN FILMS;

REACTION KINETICS; THIN FILMS; ULTRAHIGH VACUUM;

CERIUM COMPOUNDS;

EID: 0037122618     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(01)01627-9     Document Type: Article

References (13)