Field emission from an electron-beam irradiated C60 film

Journal of Applied Physics

Volumn 92, Issue 12, 2002, Pages 7302-7305

  Hara, Toshiki ^b   Onoe, Jun ^c   Takeuchi, Kazuo ^a  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b SEIKO EPSON CORPORATION   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; COALESCENCE; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRON IRRADIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ULTRAHIGH VACUUM;

FIELD EMISSIONS;

PLASTIC FILMS;

EID: 0037115593     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1522745     Document Type: Article

References (19)

1. A.M. Rao, P. Zhou, K.-A. Wang, G.T. Hager, J.M. Holden, Y. Wang, W.-T. Lee, X.-X. Bi, P.C. Eklund, D.S. Cornett, M.A. Duncan, and I.J. Amster, Science 259, 955 (1993).
2. Y. Iwasa, T. Arima, R.M. Fleming, T. Siegrist, O. Zhou, R.C. Haddon, L.J. Rothberg, K.B. Lyons, H.L. Carter Jr., A.F. Hebard, R. Tycko, G. Dabbagh, J.J. Krajewski, G.A. Thomas, and T. Yagi, Science 264, 1570 (1994).
3. Y. Wang, J.M. Holden, X.-X. Bi, and P.C. Eklund, Chem. Phys. Lett. 217, 413 (1994).
4. T. Hara, J. Onoe, H. Tanaka, Y. Li, and K. Takeuchi, Jpn. J. Appl. Phys., Part 1 39, 1872 (2000).
5. J. Ihm and S. Han, Science and Application of Nanotubes, edited by D. Tománek and R.J. Enbody (Kluwer/Plenum, New York, 2000), pp. 239-251.
6. A.H. Jayatissa, F. Saito, and N. Saito, J. Phys. D 32, 1443 (1999).
7. H.H. Busta, J. Micromech. Microeng. 2, 43 (1992).
8. R.H. Fowler and L. Nordheim, Proc. R. Soc. London, Ser. A 119, 173 (1928).
9. K.-J. Fu, W.L. Karney, O.L. Chapman, S.-M. Huang, R.B. Kaner, F. Diederich, K. Holczer, and R.L. Whetten, Phys. Rev. B 46, 1937 (1992).
10. M.R.C. Hunt, J. Schmidt, and R.E. Palmer, Phys. Rev. B 60, 5927 (1999).
11. P.C. Eklund, P. Hou, K.-A. Wang, G. Dresselhaus, and M.S. Dresselhaus, J. Phys. Chem. Solids 53, 1391 (1992).
12. T.I. Hukka and J. Zhang, J. Phys. Chem. B 104, 7115 (2000); J. Hong, A. Gouller, and G. Turban, Thin Solid Films 364, 144 (2000).
13. T.I. Hukka and J. Zhang, J. Phys. Chem. B 104, 7115 (2000); J. Hong, A. Gouller, and G. Turban, Thin Solid Films 364, 144 (2000).
14. K. Esfarjani, Y. Hashi, J. Onoe, K. Takeuchi, and Y. Kawazoe, Phys. Rev. B 57, 223 (1998); J. Onoe, Y. Hashi, K. Esfarjani, T. Hara, K. Takeuchi, and Y. Kawazoe, Chem. Phys. Lett. 315, 19 (1999).
15. K. Esfarjani, Y. Hashi, J. Onoe, K. Takeuchi, and Y. Kawazoe, Phys. Rev. B 57, 223 (1998); J. Onoe, Y. Hashi, K. Esfarjani, T. Hara, K. Takeuchi, and Y. Kawazoe, Chem. Phys. Lett. 315, 19 (1999).
16. Y. Gotoh and Soji Kajiura, J. Nucl. Mater. 266, 1051 (1999).
17. A.S. Lobach, Y.M. Shul'ga, O.S. Roshchupkina, A.I. Rebrov, A.A. Perov, Y.G. Morozov, V.N. Spector, and A.A. Ovchinnikov, Fullerene Sci. Technol. 6, 375 (1998); R. Bini, J. Ebenhoch, M. Fanti, P.W. Fowler, S. Leach, G. Orlandi, C. Rüchardt, J.P.B. Sandall, and F. Zerbetto, Chem. Phys. 232, 75 (1998).
18. A.S. Lobach, Y.M. Shul'ga, O.S. Roshchupkina, A.I. Rebrov, A.A. Perov, Y.G. Morozov, V.N. Spector, and A.A. Ovchinnikov, Fullerene Sci. Technol. 6, 375 (1998); R. Bini, J. Ebenhoch, M. Fanti, P.W. Fowler, S. Leach, G. Orlandi, C. Rüchardt, J.P.B. Sandall, and F. Zerbetto, Chem. Phys. 232, 75 (1998).
19. M. Miki, T. Wakabayashi, T. Momose, and T. Shida, J. Phys. Chem. 100, 12135 (1996).