The initial behaviour of freshly etched copper in moderately acid, aerated chloride solutions

Electrochimica Acta

Volumn 47, Issue 27, 2002, Pages 4279-4290

  Bech Nielsen, G ^a   Jaskula, M ^a,b   Chorkendorff, I ^a   Larsen, J ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b JAGIELLONIAN UNIVERSITY   (Poland)

Author keywords

Avrami equation; Corrosion measurements by titration (CMT); Freshly etched copper; Potentials of metal oxide couples; Thin Cu2O layers

Indexed keywords

CHLORINE COMPOUNDS; COPPER CORROSION; COPPER OXIDES; DISSOLUTION; ELECTROCHEMISTRY; ETCHING; PH EFFECTS; PHASE TRANSITIONS; SPECTROSCOPIC ANALYSIS; SURFACE CHEMISTRY; TITRATION;

AUGER SPECTROSCOPY;

COPPER;

EID: 0037109626     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(02)00415-2     Document Type: Article

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