Microstructure study of amorphous vanadium oxide thin films using raman spectroscopy

Journal of Applied Physics

Volumn 92, Issue 4, 2002, Pages 1893-1897

  Lee, Se Hee ^a   Cheong, Hyeonsik M ^b   Je Seong, Maeng ^a   Liu, Ping ^a   Tracy, C Edwin ^a   Mascarenhas, Angelo ^a   Pitts, J Roland ^a   Deb, Satyen K ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Sogang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; DIFFERENT MECHANISMS; DIRECT CONVERSION; HYDROGEN INSERTION; LITHIUM INTERCALATION; LOWER FREQUENCIES; MICROSTRUCTURAL CHANGES; OXYGEN ATOM; OXYGEN DEFICIENCY; RAMAN PEAK; SINGLE OXYGEN; STRETCHING MODES; VANADIUM OXIDE THIN FILMS;

HYDROGEN; LITHIUM; OXYGEN; RAMAN SCATTERING; RAMAN SPECTROSCOPY; VANADIUM COMPOUNDS;

AMORPHOUS FILMS;

EID: 0037103695     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1495074     Document Type: Article

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