Charge injection and transport in electrochemical films of poly(3-hexylthiophene)

Journal of Applied Physics

Volumn 92, Issue 4, 2002, Pages 2035-2040

  Valaski, R ^a   Moreira, L M ^a   Micaroni, L ^a   Hummelgen I A ^a  

^a FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AU ELECTRODES; ELECTRICAL CONDUCTIVITY; ELECTRICAL MEASUREMENT; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL FILMS; ENERGY DIAGRAM; GLASS SUBSTRATES; POLY(3-HEXYLTHIOPHENE); POSITIVE CHARGES; SUBSTRATE MATERIAL;

CARRIER MOBILITY; ELECTRIC CONDUCTIVITY; ELECTRODEPOSITION; REDUCTION; SUBSTRATES; TIN;

ELECTRIC VARIABLES MEASUREMENT;

EID: 0037103480     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1494850     Document Type: Article

References (33)

1. S. Marchant and P. J. S. Foot, Mater. Sci. Forum 9, 269 (1999). msf MSFOEP 0255-5476
2. B. D. Malhotra, W. Takashima, S. S. Pandey, R. Singhal, K. Endo, M. Rikukawa, and K. Kaneto, Jpn. J. Appl. Phys., Part 1 38, 6768 (1999). jjb JAPNDE 0021-4922
3. K. Kaneto, K. Hatae, S. Nagamatsu, W. Takashima, S. S. Pandey, K. Endo, and M. Rikukawa, Jpn. J. Appl. Phys., Part 2 38, L1188 (1999). jjc JAPLD8 0021-4922
4. P. J. Brown, H. Sirringhaus, and R. H. Friend, Synth. Met. 101, 557 (1999). sym SYMEDZ 0379-6779
5. R. Valaski, A. F. Bozza, L. Micaroni, and I. A. Hümmelgen, J. Solid State Electrochem. 4, 390 (2000). 93b JSSEFS 1432-8488
6. G. Juska, K. Arlauskas, R. Österbacka, and H. Stubb, Synth. Met. 109, 173 (2000). sym SYMEDZ 0379-6779
7. H. Sirringhaus, P. J. Brown, R. H. Friend, M. M. Nielsen, K. Bechgaard, B. M. W. Langeveld-Voss, A. J. H. Spiering, R. A. J. Janssen, and E. W. Meijer, Synth. Met. 111-112, 129 (2000). sym SYMEDZ 0379-6779
8. B. Wegewijs, F. C. Grozema, L. D. A. Siebbeles, M. P. de Haas, and D. M. de Leuw, Synth. Met. 119, 431 (2001). sym SYMEDZ 0379-6779
9. A. N. Aleshin, H. Sandberg, and H. Stubb, Synth. Met. 121, 1449 (2001). sym SYMEDZ 0379-6779
10. S. S. Pandey, W. Takashima, T. Endo, M. Rikukawa, and K. Kaneto, Synth. Met. 121, 1561 (2001). sym SYMEDZ 0379-6779
11. S. Nagamatsu, S. S. Pandey, W. Takashima, T. Endo, M. Rikukawa, and K. Kaneto, Synth. Met. 121, 1563 (2001). sym SYMEDZ 0379-6779
12. J. Gruber, R. W. C. Li, and I. A. Hümmelgen, in Handbook of Advanced Electronic and Photonic Materials and Devices, edited by H. S. Nalwa (Academic, New York, 2001), p. 175.
13. M. Kobashi and H. Takeuchi, Synth. Met. 101, 585 (1999). sym SYMEDZ 0379-6779
14. M. Onoda, Y. Manda, S. Morita, and K. Yoshino, Jpn. J. Appl. Phys., Part 1 31, 2265 (1992). jjb JAPNDE 0021-4922
15. R. Valaski, E. Silveira, L. Micaroni, and I. A. Hümmelgen, J. Solid State Electrochem. 5, 261 (2001). 93b JSSEFS 1432-8488
16. D. Ma, I. A. Hümmelgen, X. Jing, Z. Hong, L. Wang, X. Zhao, F. Wang, and F. E. Karasz, J. Appl. Phys. 87, 312 (2000). jap JAPIAU 0021-8979
17. M. Koehler and I. A. Hümmelgen, J. Appl. Phys. 87, 3074 (2000). jap JAPIAU 0021-8979
18. C. R. Crowell and S. M. Sze, Solid-State Electron. 9, 1035 (1996). sel SSELA5 0038-1101
19. P. W. M. Blom and M. C. J. M. Vissenberg, Mater. Sci. Eng. 27, 53 (2000). mse MSCEAA 0025-5416
20. D. R. Lide, CRC Handbook of Chemistry and Physics (Chemical Rubber Corp., Boca Raton, FL, 1995).
21. A. C. Arias, L. S. Roman, T. Kugler, R. Toniolo, M. S. Meruvia, and I. A. Hümmelgen, Thin Solid Films 371, 201 (2000). tsf THSFAP 0040-6090
22. Y. P. Yadava, G. Denicolo, A. C. Arias, L. S. Roman, and I. A. Hümmelgen, Mater. Chem. Phys. 48, 263 (1997). mcp MCHPDR 0254-0584
23. D. T. Whitehouse, Handbook of Surface Metrology (Institute of Physics, University of Reading, Birkshire 1994), p. 14.
24. R. Valaski, S. Ayoub, L. Micaroni, and I. A. Hümmelgen, Thin Solid Films 388, 171 (2001). tsf THSFAP 0040-6090
25. P. W. M. Blom, M. J. M. de Jong, and C. T. H. F. Liedenbaum, Polym. Adv. Technol. 9, 390 (1998). pad PADTE5 1042-7147
26. M Kobashi and H. Takeuchi, Macromolecules 31, 7273 (1998). mml MAMOBX 0024-9297
27. D. Ma, I. A. Hümmelgen, R. W. C. Li, and J. Gruber, J. Phys. D 33, 1376 (2000). jpd JPAPBE 0022-3727
28. T. van Woudenbergh, P. W. M. Blom, M. C. J. M. Vissenberg, and J. N. Huiberts, Appl. Phys. Lett. 79, 1697 (2001). apl APPLAB 0003-6951
29. V. I Arkhipov, E. V. Emelianova, Y. H. Tak, and H. Bässler, J. Appl. Phys. 84, 848 (1998). jap JAPIAU 0021-8979
30. O. A. El-Rashiedy and S. Holdcroft, J. Phys. Chem. 100, 5481 (1999). jch JPCHAX 0022-3654
31. H. Eckhardt, L. W. Shacklette, K. Y. Jen, and R. L. Elsenbaumer, J. Chem. Phys. 91, 1303 (1989). jcp JCPSA6 0021-9606
32. M. Onoda, K. Tada, A. A. Zakhidov, and K. Yoshino, Thin Solid Films 331, 76 (1998). tsf THSFAP 0040-6090
33. S. Janietz, D. D. C. Bradley, M. Grell, C. Giebeler, M. Inbasekaran, and E. P. Woo, Appl. Phys. Lett. 73, 2453 (1998). apl APPLAB 0003-6951