Probe diagnostics of high pressure microwave discharge in helium

Journal of Applied Physics

Volumn 91, Issue 12, 2002, Pages 9529-9538

  Talukder, M R ^a   Korzec, D ^a   Kando, M ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGEBRAIC FUNCTIONS; FITTING TECHNIQUES; HIGH PRESSURE; HIGH-PRESSURE HELIUM; ION SATURATION CURRENT; ION TEMPERATURE; ITERATIVE PROCEDURES; MICROWAVE DISCHARGE; MICROWAVE POWER; NUMERICAL RESULTS; PLASMA PARAMETER; PROBE CHARACTERISTICS; PROBE-MODEL; SECONDARY ELECTRON EMISSIONS;

ELECTRON TEMPERATURE; HELIUM; NUMERICAL METHODS; PLASMA DENSITY; PLASMA DEVICES; PROBES;

ELECTRIC DISCHARGES;

EID: 0037097872     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1478801     Document Type: Article

References (34)

1. J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Y. Jeong, R. F. Hicks, D. Shim, and C. S. Chang, Appl. Phys. Lett. 76, 288 (2000). apl APPLAB 0003-6951
2. O. A. Ivanov, A. M. Gorbachev, V. A. Koldanov, A. L. Kolisko, and A. L. Vikharev, J. Phys. IV 8, 317 (1998). jpv JPICEI 1155-4339
3. M. Kando, Eleventh Symposium on Elementary Processes and Chemical Reactions in Low Temperature Plasma (Low Tatras, Slovakia, 1998), p. 73.
4. M. R. Talukder, D. Korzec, and M. Kando, in Proceedings of the XXV International Conference on Phenomena in Ionized Gases, edited by T. Goto (Nagoya University, Nagoya, Japan, 2001), Vol. 4, p. 271.
5. A. L. Vikharev, J. Phys. IV 8, 275 (1998). jpv JPICEI 1155-4339
6. J. F. Waymouth, Phys. Fluids 7, 1843 (1964). pfl PFLDAS 0031-9171
7. G. K. Bienkowski and K. W. Chang, Phys. Fluids 11, 784 (1968). pfl PFLDAS 0031-9171
8. Y. S. Chou, L. Talbot, and D. R. Willis, Phys. Fluids 9, 2150 (1966). pfl PFLDAS 0031-9171
9. V. M. Zakharova, Yu. M. Kagan, K. S. Mustafin, and V. I. Perel, Sov. Phys. Tech. Phys. 5, 411 (1960). spt SPTPA3 0038-5662
10. E. Wasserstrom, C. H. Su, and R. F. Probstein, Phys. Fluids 8, 56 (1965). pfl PFLDAS 0031-9171
11. Z. Zakrzewski and T. Kopiczynski, Plasma Phys. 16, 1195 (1974). plp PLPHBZ 0032-1028
12. G. L. Schulz and S. C. Brown, Phys. Rev. 98, 1642 (1955). phr PHRVAO 0031-899X
13. R. L. F. Boyd, Proc. R. Soc. London 64B, 795 (1951).
14. Yu. M. Kagan and V. I. Perel, Sov. Phys. Usp. 6, 767 (1964). sop SOPUAP 0038-5670
15. M. B. Hopkins and W. G. Graham, Rev. Sci. Instrum. 57, 2210 (1986). rsi RSINAK 0034-6748
16. P. R. Smy, Adv. Phys. 25, 517 (1976). adp ADPHAH 0001-8732
17. E. Leveroni and E. Pfender, Rev. Sci. Instrum. 60, 3744 (1989). rsi RSINAK 0034-6748
18. W. B. Bush and F. E. Fendell, J. Plasma Phys. 4, 317 (1970). jpl JPLPBZ 0022-3778
19. K. Toba and S. Sayano, J. Plasma Phys. 1, 407 (1967). jpl JPLPBZ 0022-3778
20. F. Fendell, Combust. Sci. Technol. 1, 331 (1970). cbs CBSTB9 0010-2202
21. R. L. Chapkis and E. Baum, AIAA J. 9, 1963 (1971). aia AIAJAH 0001-1452
22. J. S. Chang and J. G. Laframboise, Phys. Fluids 19, 25 (1976). pfl PFLDAS 0031-9171
23. M. S. Benilov, J. Phys. D 33, 1683 (2000). jpd JPAPBE 0022-3727
24. C. H. Su and S. H. Lam, Phys. Fluids 6, 1479 (1963). pfl PFLDAS 0031-9171
25. I. M. Cohen, Phys. Fluids 6, 1492 (1963). pfl PFLDAS 0031-9171
26. J. D. Swift and M. J. R. Schwar, Electrical Probes for Plasma Diagnostics (Illifee, London, 1970), Chap. 4, pp. 113-200.
27. F. F. Chen, Plasma Diagnostic Technique, edited by R. H. Huddleston and S. L. Leonard, (Academic, New York, 1965), Chaps. 9 and 10, pp. 172-219.
28. P. M. Chung, L. Talbot, and K. J. Touryan, Electric Probes in Stationary and Flowing Plasmas (Springer-Verlag, Berlin, 1975).
29. S. C. Brown, Basic Data of Plasma Physics, 1966, 2nd ed. (MIT, Cambridge, MA, 1966), Chap. 4, pp. 79-129.
30. H. D. Hagstrum, Phys. Rev. 96, 336 (1954). phr PHRVAO 0031-899X
31. S. Klage and M. Tichu, Czech. J. Phys., Sect. B 35, 988 (1985). czy CZYPAO 0011-4626
32. D. Korzec, M. R. Talukder, and M. Kando, Sci. Technol. Adv. Mater. (STAM) 2/3-4, 595 (2001).
33. K. W. Chang and G. K. Bienkowski, Phys. Fluids 13, 902 (1970). pfl PFLDAS 0031-9171
34. L. J. Overzet and J. Kleber, Plasma Sources Sci. Technol. 7, 512 (1998). pst PSTEEU 0963-0252