메뉴 건너뛰기




Volumn 91, Issue 10 I, 2002, Pages 7953-7955

Enhanced performance of CoFe/AlO x/CoFe magnetic tunnel junctions prepared by an off-axis rf remote plasma oxidation method

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC OXYGEN; ELECTRICAL BREAKDOWN VOLTAGE; HIGH UNIFORMITY; HIGH-POWER OPERATION; INSULATING BARRIERS; INSULATING LAYERS; MAGNETIC TUNNEL JUNCTION; MAGNETIC TUNNELING JUNCTIONS; OFF-AXIS; OFF-AXIS GEOMETRY; OXIDATION PROCESS; REMOTE OXIDATION; RF PLASMA; RF REMOTE PLASMA; ROOT MEAN SQUARE; SELF BIAS VOLTAGE; STRUCTURAL INFORMATION;

EID: 0037095273     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1452647     Document Type: Article
Times cited : (10)

References (10)
  • 2
    • 0011093565 scopus 로고    scopus 로고
    • jaJAPIAU 0021-8979
    • M. Daughton, J. Appl. Phys. 81, 378 (1997). jap JAPIAU 0021-8979
    • (1997) J. Appl. Phys. , vol.81 , pp. 378
    • Daughton, M.1
  • 10
    • 0000265228 scopus 로고    scopus 로고
    • apl APPLAB 0003-6951
    • N. García, Appl. Phys. Lett. 77, 1351 (2000). apl APPLAB 0003-6951
    • (2000) Appl. Phys. Lett. , vol.77 , pp. 1351
    • García, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.