Magnetoelastic properties of epitaxially grown Co 35Pd 65 alloy films on Cu/Si(001)

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 7179-7181

  Jeong, Jong Ryul ^a   Kim, Jonggeol ^a   Kim, Sang Koog ^a   Lee, Jeong Won ^a   Shin, Sung Chul ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY FILM; EPITAXIALLY GROWN; GROWTH STRESS; GROWTH STRUCTURES; INSITU STRESS; LAYER THICKNESS; MAGNETOELASTIC COUPLINGS; MAGNETOELASTIC PROPERTIES; RELAXATION MECHANISM; STM STUDY; SUBMONOLAYER; THREE-DIMENSIONAL (3D) ISLANDS;

EPITAXIAL GROWTH; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; THREE DIMENSIONAL;

METALLIC FILMS;

EID: 0037095269     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448798     Document Type: Article

References (18)

1. Ultrathin Magnetic Structures, edited by J. A. C. Bland and B. Heinrich (Springer-Verlag, Berlin, 1994), Vols. I and II.
2. G. Wedler, J. Walz, A. Greuer, and R. Koch, Phys. Rev. B 60, R11313 (1999). prb PRBMDO 0163-1829
3. S.-K. Kim, J.-W. Lee, J.-R. Jeong, J. Kim, and S.-C. Shin, Appl. Phys. Lett. 79, 1652 (2001). apl APPLAB 0003-6951
4. R. Jungblut, M. T. Johnson, J. aan de Stegge, A. Reinders, and F. J. A. den Broeder, J. Appl. Phys. 75, 6424 (1994). jap JAPIAU 0021-8979
5. J.-R. Jeong and S.-C. Shin, Appl. Phys. Lett. 75, 3174 (1999). apl APPLAB 0003-6951
6. J.-R. Jeong, Y.-S. Kim, and S.-C. Shin, J. Appl. Phys. 85, 5762 (1999). jap JAPIAU 0021-8979
7. D. Sander, Rep. Prog. Phys. 62, 809 (1999). rpp RPPHAG 0034-4885
8. H. Takahashi, Sh. Tsunashima, S. Iwata, and S. Uchiyama, Jpn. J. Appl. Phys. 32, L1328 (1993). jjc JAPLD8 0021-4922
9. J. R. Childress, J. L. Duvail, S. Jasmin, A. Barthélémy, A. Fert, A. Schuhl, O. Durand, and P. Galtier, J. Appl. Phys. 75, 6412 (1994). jap JAPIAU 0021-8979
10. E. Gan'shina, V. Guschin, I. Romanov, A. Skobelev, and A. Tselev, J. Magn. Magn. Mater. 193, 174 (1999). jmm JMMMDC 0304-8853
11. S. U. Jen, C. M. Chung, and W. L. Chen, J. Magn. Magn. Mater. 220, 205 (2000). jmm JMMMDC 0304-8853
12. G. Lauhoff, C. A. F. Vaz, J. A. C. Bland, J. Lee, and T. Suzuki, Phys. Rev. B 61, 6805 (2000). prb PRBMDO 0163-1829
13. B. G. Demczyk, R. Naik, G. Auner, C. Kota, and U. Rao, J. Appl. Phys. 75, 1956 (1994). jap JAPIAU 0021-8979
14. R. A. Lukaszew, Y. Sheng, C. Uher, and R. Clarke, Appl. Phys. Lett. 76, 724 (2000). apl APPLAB 0003-6951
15. B. Schulz and K. Baberschke, Phys. Rev. B 50, 13467 (1994). prb PRBMDO 0163-1829
16. Z. S. Shan, Ping He, C. Moore, Jogh Woollam, and D. J. Sellmyer, J. Appl. Phys. 73, 6057 (1993). jap JAPIAU 0021-8979
17. H. Fujiwara, H. Kadomatsu, and T. Tokunsga, J. Magn. Magn. Mater. 31, 809 (1983). jmm JMMMDC 0304-8853
18. J.-R. Jeong, J. Kim, J.-W. Jeong, S.-K. Kim, and S.-C. Shin, Appl. Phys. Lett. 79, 3296 (2001). apl APPLAB 0003-6951