Control of the tilted orientation of CoCrPt/Ti thin film media by collimated sputtering

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 8007-8009

  Zheng, Y F ^a   Wang, J P ^a   Ng, V ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COLLIMATED SPUTTERING; COLUMNAR STRUCTURES; COMBINED EFFECT; CRYSTALLOGRAPHIC ORIENTATIONS; DC MAGNETRON SPUTTERING; EASY AXIS; GLASS SUBSTRATES; HEAD FIELDS; MAGNETIC LAYERS; MAXIMUM VALUES; OBLIQUE ANGLES; ROCKING CURVES; TARGET MATERIALS; THIN FILM MEDIA; ULTRAHIGH DENSITY; UNDERLAYERS;

DEPOSITS; FILM GROWTH; MAGNETIC DEVICES; MAGNETIC MATERIALS; MAGNETIC THIN FILMS; MAGNETRON SPUTTERING; SUBSTRATES;

MAGNETIC RECORDING;

EID: 0037095233     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1456416     Document Type: Article

References (5)

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4. S. Sawada et al., U.S. Patent No. 5804046.
5. L. Abelmann and J. C. Lodder, Thin Solid Films 305, 1 (1997). tsf THSFAP 0040-6090