Difference in coercivity between Co/Fe and Fe/Co bilayers

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 7218-7220

  Park, M H ^a   Hong, Y K ^a   Gee, S H ^a   Mottern, M L ^a   Jang, T W ^a   Burkett, S ^b  

^a UNIVERSITY OF IDAHO   (United States)

^b Boise State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; FE LAYER; FERROMAGNETIC BILAYERS; FERROMAGNETIC LAYERS; GLASS SUBSTRATES; IN-PLANE DIRECTION; MAGNETIZATION REVERSAL PROCESS; SI SUBSTRATES; SILICON SUBSTRATES; THICKNESS DEPENDENCE;

FERROMAGNETIC MATERIALS; FERROMAGNETISM; MAGNETIZATION REVERSAL; SATURATION MAGNETIZATION; SUBSTRATES; SURFACE ROUGHNESS;

COERCIVE FORCE;

EID: 0037095161     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448806     Document Type: Article

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