Local mapping of strain at grain boundaries in colossal magnetoresistive films using x-ray microdiffraction

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 7742-7744

  Soh, Yeong Ah ^a   Evans, P G ^b   Cai, Z ^c   Lai, B ^c   Kim, C Y ^d   Aeppli, G ^a   Mathur, N D ^e   Blamire, M G ^e   Isaacs, E D ^b  

^a NEC LABORATORIES AMERICA   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

^d Northwestern University   (United States)

^e UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BICRYSTAL SUBSTRATES; COLOSSAL MAGNETORESISTIVE; ELASTIC STRAIN; LENGTH SCALE; LOCAL MAPPING; SRTIO; X RAY MICRODIFFRACTION;

EPITAXIAL FILMS; MANGANESE OXIDE; STRONTIUM TITANATES; X RAY DIFFRACTION;

GRAIN BOUNDARIES;

EID: 0037094903     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1455609     Document Type: Article

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