Magnetic entropy change in LaFe 13-xSi x intermetallic compounds

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 8537-8539

  Wen, G H ^a   Zheng, R K ^a   Zhang, X X ^a   Wang, W H ^b   Chen, J L ^b   Wu, G H ^b  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FIELD CHANGE; FIRST-ORDER; ITINERANT-ELECTRON METAMAGNETIC TRANSITIONS; MAGNETIC ENTROPY CHANGE; MAXIMUM VALUES; POTENTIAL MATERIALS; SECOND-ORDER PHASE TRANSITION; SQUID MAGNETOMETERS; TEMPERATURE RANGE;

CURIE TEMPERATURE; ENTROPY; LANTHANUM ALLOYS; MAGNETIC VARIABLES MEASUREMENT; MAGNETISM; X RAY POWDER DIFFRACTION;

SILICON;

EID: 0037094880     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448793     Document Type: Article

References (14)

1. W. F. Giaugue, J. Am. Chem. Soc. 49, 1864 (1927). acs JACSAT 0002-7863
2. G. V. Brown, J. Appl. Phys. 47, 3673 (1976). jap JAPIAU 0021-8979
3. E. P. Wohlfarch, Ferromagnetic Materials (North-Holland, Amsterdam, 1980), Vol. 1.
4. T. Hashimoto, T. Kuzuhara, M. Sahashi, K. Inomata, A. Tomokiyo, and H. Yayama, J. Appl. Phys. 62, 3873 (1987). jap JAPIAU 0021-8979
5. H. Oesterreicher and F. T. Parker, J. Appl. Phys. 55, 4334 (1984). jap JAPIAU 0021-8979
6. X. X. Zhang, J. Tejada, Y. Xin, G. F. Sun, K. W. Wong, and X. Bohigas, Appl. Phys. Lett. 69, 3596 (1996). apl APPLAB 0003-6951
7. Z. B. Guo, Y. W. Duo, J. S. Zhu, H. Huang, W. P. Ding, and D. Feng, Phys. Rev. Lett. 78, 1142 (1997). prl PRLTAO 0031-9007
8. V. K. Pecharsky and K. A. Gschneidner, Jr., Appl. Phys. Lett. 70, 3299 (1997). apl APPLAB 0003-6951
9. X. X. Zhang, G. H. Wen, F. W. Wang, W. H. Wang, C. H. Yu, and G. H. Wu, Appl. Phys. Lett. 77, 3072 (2000). apl APPLAB 0003-6951
10. T. T. M. Palstra, J. A. Mydosh, G. J. Nieuwenhuys, A. M. van der Kraan, and K. H. J. Buschow, J. Magn. Magn. Mater. 36, 290 (1983). jmm JMMMDC 0304-8853
11. A. Fujita, Y. Akamatsu, and K. Fukamichi, J. Appl. Phys. 85, 4756 (1999). jap JAPIAU 0021-8979
12. F. X. Hu, B. G. Shen, J. R. Sun, Z. H. Cheng, G. H. Rao, and X. X. Zhang, Appl. Phys. Lett. 78, 3675 (2001). apl APPLAB 0003-6951
13. M. Foldeaki, R. Chahine, and T. K. Bose, J. Appl. Phys. 77, 3528 (1995). jap JAPIAU 0021-8979
14. R. D. McMichael, J. J. Ritter, and R. D. Shull, J. Appl. Phys. 73, 6946 (1993). jap JAPIAU 0021-8979