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Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 8441-8443

Stress level in Finemet materials studied by impedanciometry

(3) Carara, Marcos a Baibich, M N b Sommer, R L a

a FEDERAL UNIVERSITY OF SANTA MARIA (Brazil)

b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; ANNEALING TEMPERATURES; AS-CAST; AVERAGE DIAMETER; DOMAIN WALL ENERGY; EFFECTIVE PERMEABILITY; FINEMET; IMPEDANCE SPECTRUM; MAGNETIC SOFTNESS; MAGNETIZATION ROTATIONS; MAGNETOELASTIC ANISOTROPY; MAGNETORESTRICTION; MELT-SPUN; NANOCRYSTALLINES; SOFT MAGNETIC PROPERTIES; STRESS LEVELS;

ANNEALING; MAGNETIC PROPERTIES; MAGNETIZATION; MELT SPINNING; SILICON;

AMORPHOUS SILICON;

EID: 0037094879 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1453948 Document Type: Article

Times cited : (18)

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