Substrate-induced mechanical and dielectric properties of a ferroelectric thin film

Journal of Applied Physics

Volumn 91, Issue 8, 2002, Pages 4973-4982

  Lahoche, L ^a   Lorman, V ^b   Rochal, S B ^c   Roelandt, J M ^a  

^a UNIVERSITÉ DE TECHNOLOGIE DE COMPIÈGNE   (France)

^b CNRS   (France)

^c SOUTHERN FEDERAL UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

C-DOMAIN; DEPOSITION PROCESS; DISLOCATION FORMATION; FERROELECTRIC STATE; MECHANICAL AND DIELECTRIC PROPERTIES; MECHANICAL BEHAVIOR; MECHANICAL BOUNDARIES; MGO; NON-HOMOGENEOUS; NUMERICAL MODELING; OXIDE SUBSTRATES; PHENOMENOLOGICAL MODELS; POLARIZATION DIRECTION; RESIDUAL STRAINS; ROOM TEMPERATURE; STABILITY REGIONS; SUBSEQUENT COOLING; SUPERSTRUCTURE FORMATION; UNIT CELLS;

EPITAXIAL FILMS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; MECHANICAL PROPERTIES; ULTRATHIN FILMS;

SUBSTRATES;

EID: 0037091850     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1464207     Document Type: Article

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