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Volumn 41, Issue 4, 2002, Pages

Highly (112)-oriented CuInS2 thin films deposited by a one-stage RF reactive sputtering process

Author keywords

CuInS2; One stage process; RF reactive sputtering; Thin films

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; FILM GROWTH; FILM PREPARATION; MORPHOLOGY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING GLASS; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES;

EID: 0037089142     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l484     Document Type: Letter
Times cited : (11)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.