Evaluation of desorption activation energy of SiF4 molecules

Vacuum

Volumn 68, Issue 1, 2002, Pages 29-30

  Knizikevicius R ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Desorption activation energy; SiF4

Indexed keywords

ACTIVATION ENERGY; DESORPTION; DIFFERENTIAL EQUATIONS; PLASMAS; REACTION KINETICS; SEMICONDUCTING SILICON; SILICON COMPOUNDS;

PLASMOCHEMICAL ETCHING;

REACTIVE ION ETCHING;

EID: 0037078240     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00278-6     Document Type: Article

References (4)

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2. Knizikevičius R., Galdikas A., Grigonis A., Pranevičius L. Lith J Phys. 40:2000;343-351.
3. Vosylius J, Pranevičius L. Ion Beam Activated Processes on the Surfaces of Solids. Vilnius: Mokslas, 1987. p. 212.
4. Lieberman MA, Lichtenberg AJ. Principles of Plasma Discharges and Materials Processing. New York: Wiley, 1994. p. 572.