Structural characterization of chemically deposited Bi 2 S 3 and Bi 2 Se 3 thin films

Applied Surface Science

Volumn 187, Issue 1-2, 2002, Pages 108-115

  Lokhande, C D ^a   Sankapal, B R ^a   Mane, R S ^a   Pathan, H M ^a   Muller, M ^b   Giersig, M ^b   Tributsch, H ^b   Ganeshan, V ^c  

^a SHIVAJI UNIVERSITY   (India)

^b HAHN MEITNER INSTITUT   (Germany)

^c IUC for DAE Facilities   (India)

Author keywords

Chemical deposition; Nanostructure; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH COMPOUNDS; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; LOW TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SURFACE ROUGHNESS; X RAY DIFFRACTION;

CHEMICAL DEPOSITION;

THIN FILMS;

EID: 0037075237     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00813-3     Document Type: Article

References (12)