Surface plasmon characterization of positive-tone photoimaging in polymer Langmuir-Blodgett films

Langmuir

Volumn 18, Issue 25, 2002, Pages 10035-10038

  Mitsuishi, Masaya ^a   Li, Tiesheng ^a   Miyashita, Tokuji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING RESISTANCE; PHOTOPATTERN FORMATION; POSITIVE-TONE PHOTOIMAGING; SURFACE PLASMON CHARACTERIZATION;

ETCHING; IMAGE ANALYSIS; NANOSTRUCTURED MATERIALS; PLASTIC FILMS; PRESSURE EFFECTS; SURFACE PROPERTIES; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; ULTRATHIN FILMS;

LANGMUIR BLODGETT FILMS;

EID: 0037059191     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la020420x     Document Type: Article

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