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Volumn 406, Issue 1-2, 2002, Pages 1-16

Chemical vapour deposition of polycrystalline AlN films from AlCl3-NH3 mixtures. Analysis and modelling of transport phenomena

(4) Dollet, A a,b Casaux, Y a,b Chaix, G a,b Dupuy, C a,b

a Centre National de la Recherche Scientifique (France)

b UPR 8521 Rambla de la Thermodynamique (France)

Author keywords

Aluminium nitride; Chemical vapour deposition; Computer simulation; Transport phenomena

Indexed keywords

ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DIFFUSION; FILM GROWTH; MASS TRANSFER; MATHEMATICAL MODELS; MIXTURES; POLYCRYSTALLINE MATERIALS; RATE CONSTANTS;

TRANSPORT PHENOMENA;

THIN FILMS;

EID: 0037051241 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01782-5 Document Type: Article

Times cited : (32)

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