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Volumn 234, Issue 1-2, 2002, Pages 191-205

Low temperature use of SiC-supported NiS2-based catalysts for selective H2S oxidation: Role of SiC surface heterogeneity and nature of the active phase

Author keywords

Hydrogen sulfide oxidation; Hydrophilic; Hydrophobic; Nickel sulfide; Silicon carbide; Sulfur formation

Indexed keywords

HYDROGEN SULFIDE; HYDROPHILICITY; HYDROPHOBICITY; LOW TEMPERATURE EFFECTS; MESOPOROUS MATERIALS; NICKEL COMPOUNDS; OXIDATION; POROSITY; SILICA; SILICON CARBIDE; SURFACE PROPERTIES;

EID: 0037043484     PISSN: 0926860X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0926-860X(02)00226-0     Document Type: Article
Times cited : (57)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.