Magnetron sputtered AZO thin films on commercial ITO glass for application of a very low resistance transparent electrode

Journal of Physics D: Applied Physics

Volumn 35, Issue 23, 2002, Pages 3096-3100

  Fang, Guojia ^a,b   Li, Dejie ^a   Yao, Bao Lun ^a  

^a TSINGHUA UNIVERSITY   (China)

^b HUBEI UNIVERSITY OF ARTS AND SCIENCE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DEPOSITION; ELECTRODES; HALL EFFECT; INDIUM COMPOUNDS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTICAL GLASS; SEMICONDUCTOR DOPING; SUBSTRATES; TEXTURES; ZINC OXIDE;

ALUMINUM OXIDE; DEPOSITION PARAMETER SPACE; HALL MOBILITY; INDIUM OXIDES;

THIN FILMS;

EID: 0037039064     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/35/23/310     Document Type: Article

References (26)

1. Hamberg I and Granqvist C G 1986 J. Appl. Phys. 60 R123
2. Elfallal I, Pilkington R C and Hill A E 1993 Thin Solid Films 223 303
3. Minami T 2000 MRS. Bull. 25 52
4. Ellmer K 2001 J. Phys. D: Appl. Phys. 34 3097
5. Chen M, Pei Z L, Wang X, Sun C and Wang L S 2001 J. Vac. Sci. Technol. A 19 963
6. Ramakrishna Reddy K T and Miles R W 1998 J. Mater. Sci. Lett. 17 279
7. Nakanishi Y, Miyake A and Kominami H 1999 Appl. Surf. Sci. 142 233
8. Haga K, Kamidaira M, Kashiwaba Y, Sekiguchi T and Watanabe H 2000 J. Cryst. Growth 214 77
9. Fujita D C, Fujita S and Park S 1999 Phys. Status Solidi a 176 579
10. Jimenez-Gonzalez A E, Soto-Urueta J A and Suarez-Parra R 1998 J. Cryst. Growth 192 430
11. Vigil O, Cruz F, Santana G, Vaillant L, Morales-Acevedo A and Contreras-Puente G 2000 Appl. Surf. Sci. 161 27
12. Jin B J, Woo H S, Im S, Bae S H and Lee S Y 2001 Appl. Surf. Sci. 169-170 521
13. Meng X Q, Zhen W, Guo J P and Fan X J 2000 Appl. Phys. A: Mater. Sci. Process. 70 421
14. Minemoto T, Negami T, Nishiwaki S, Takakura H and Hamakawa Y 2000 Thin Solid Films 372 173
15. Minami T, Sonohara H, Kakumu T and Takata S 1995 Japan. J. Appl. Phys. 34 L971
16. Minami T, Yamamoto T and Miyata T 2000 Thin Solid Films 366 63
17. Tominaga K, Kataoka M, Manabe H, Ueda T and Mori I 1996 Thin Solid Films 290-291 84
18. Sun X W, Wang L D and Kwok H S 2000 Thin Solid Films 360 75
19. Choi K H, Kim J Y, Lee Y S and Kim H J 1999 Thin Solid Films 341 152
20. Li D J 2002 J. Vac. Sci. Technol. A 20 33
21. Cullity B D 1978 Elements of X-ray Diffraction 2nd edn (Reading, MA: Addison Wesley) p 102
22. 1976 Powder Diffraction Data Joint Committee on Powder Diffraction Standards, Pennsylvania, USA, p 29
23. Minami T, Sato H, Ohashi K, Tomofuji T and Takata S 1992 J. Cryst. Growth 117 370
24. Minami T, Nanto H and Takata S 1982 Appl. Phys. Lett. 41 958
25. Sinno G, Minarini C, Loreti S, Francia G D and Salluzzo A 1999 Solid State Phenomena 67 249
26. Lee G H, Yamamoto Y, Kourogi M and Ohtsu M 2001 Thin Solid Films 386 117