Microstructure and electrical properties of magnetic tunneling junction: NiFe/Co/Ta/Al-oxide/Co

Materials Science and Engineering: B

Volumn 90, Issue 1-2, 2002, Pages 13-15

  Kyung, H ^a   Yoon, C S ^a   Kim, C K ^a  

^a Hanyang University   (South Korea)

Author keywords

Magnetic tunnel junction; Magnetoresistance; Tantalum oxide

Indexed keywords

ELECTRIC PROPERTIES; INTERDIFFUSION (SOLIDS); MAGNETORESISTANCE; METALLIC FILMS; MICROSTRUCTURE; NICKEL COMPOUNDS; OXIDATION; TANTALUM;

MAGNETIC TUNNELING JUNCTIONS;

TUNNEL JUNCTIONS;

EID: 0037034717     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00717-6     Document Type: Article

References (10)