Lateral micro-ion beam induced charge characterization of chemical vapor deposition diamond

Materials Science and Engineering: B

Volumn 90, Issue 1-2, 2002, Pages 191-195

  Rongrong, Lu ^a   Manfredotti, C ^b   Fizzotti, F ^b   Vittone, E ^b   Logiudice, A ^b  

^a Shanghai Institute of Nuclear Research AcademiaSinica   (China)

^b UNIVERSITY OF TURIN   (Italy)

Author keywords

Charge collection efficiency; CVD; Diamond; Lateral micro ion beam induced charge

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC SPACE CHARGE; ELECTRON MOBILITY; ION BEAMS; SEMICONDUCTOR JUNCTIONS; SUBSTRATES;

CHARGE COLLECTION EFFICIENCY (CCE);

DIAMONDS;

EID: 0037034671     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00941-2     Document Type: Article

References (8)