Alkyl monolayers on Si(111) as ultrathin electron-beam patterning media

Journal of Electroanalytical Chemistry

Volumn 532, Issue 1-2, 2002, Pages 247-254

  Yamada, Taro ^a,b   Takano, Nao ^a   Yamada, Keiko ^a   Yoshitomi, Shuhei ^a   Inoue, Tomoyuki ^a   Osaka, Tetsuya ^a  

^a WASEDA UNIVERSITY   (Japan)

^b RIKEN   (Japan)

Author keywords

Electron beam patterning; Metal deposition; Nanometer scale fabrication; Organic monolayer; Oxidation; Si(111) wafer

Indexed keywords

ELECTRODEPOSITION; ELECTRON BEAMS; IONS; MONOLAYERS; NANOSTRUCTURED MATERIALS; OXIDATION; SCANNING TUNNELING MICROSCOPY; SOLUTIONS; SURFACE ROUGHNESS; ULTRATHIN FILMS;

ELECTRON-BEAM PATTERNING;

SILICON WAFERS;

EID: 0037031517     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(02)00865-3     Document Type: Article

References (17)

1. Int. Technology Roadmap for Semiconductors, SEMATECH, 1999.
2. Levenson M.D., Viswanathan N.S., Simpson R.A. IEEE Trans. Electron Devices. ED-29:1982;1828.
3. Fukuda H., Hasegawa N., Okazaki S. J. Vac. Sci. Technol. B7:1989;667.
4. Fujita M., Shiozawa K., Kase T., Hayakawa H., Mizuno F., Haruta R., Murai F., Okazaki S. IEEE J. Solid State Circuit. SC-23:1988;514.
5. Fujita J., Ohnishi Y., Manako S., Ochiai Y., Nomura E., Sakamoto T., Matsui S. Jpn. J. Appl. Phys. 36:1997;7769.
6. Koh M., Sawara S., Goto T., Ando Y., Shinada T., Ohdomari I. Jpn. J. Appl. Phys. 39:2000;5352.
7. Yamada T., Takano N., Yamada K., Yoshitomi S., Inoue T., Osaka T. Electrochem. Commun. 3:2001;67.
8. Yamada T., Takano N., Yamada K., Yoshitomi S., Inoue T., Osaka T. Jpn. J. Appl. Phys. 40:2001;4845.
9. Salling C.T., Lagally M.G. Science. 265:1994;502.
10. Boukherroub R., Morin S., Bensebaa F., Wayner D.D.M. Langmuir. 15:1999;3831.
11. Higashi G.S., Chabal Y.J., Trucks G.W., Raghavachari K. Appl. Phys. Lett. 56:1990;656.
12. Wade C.P., Chidsey C.E.D. Appl. Phys. Lett. 71:1997;1679.
13. Takano N., Hosoda N., Yamada T., Osaka T. J. Electrochem. Soc. 146:1999;1407.
14. Takano N., Hosoda N., Yamada T., Osaka T. Electrochim. Acta. 44:1999;3743.
15. Takano Nao, Niwa D., Yamada T., Osaka T. Electrochim. Acta. 45:2000;3263.
16. Nagahara L.A., Ohmori T., Hashimoto K., Fujishima A. J. Electroanal. Chem. 333:1992;363.
17. Nagahara L.A., Ohmori T., Hashimoto K., Fujishima A. J. Vac. Sci. Technol. A11:1993;763.