SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 193, Issue 1-4, 2002, Pages 204-209

Thermochemical process occurring in PLD-derived SiC films during vacuum annealing

(5) Wang, Yuxia a He, Haiping a Wang, Lianwei b Liu, Duo a Tang, Honggao a

a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA (China)

b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY (China)

Author keywords

PLD; SiC; Thin films; XPS

Indexed keywords

ACTIVATION ENERGY; ANNEALING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PULSED LASER DEPOSITION; SILICON CARBIDE; THERMOMECHANICAL TREATMENT; THIN FILMS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

VACUUM ANNEALING;

SURFACE TREATMENT;

EID: 0037024495 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00500-7 Document Type: Article

Times cited : (6)

References (27)

1
- 0033099620
- (1999) IEEE Trans. Electron. Device , vol.46 , Issue.3 , pp. 442
- Cooper J.A., Jr.¹ Agarwal, A.K.² Hara, K.³ Palmour, J.W.⁴ Stephani, D.⁵

2
- 0031515387
- (1997) Phys. Status Solidi B , vol.202 , pp. 335
- Nagasawa, H.¹ Yagi, K.²

3
- 0034205141
- (2000) Jpn. J. Appl. Phys. , vol.39
- Shimizu, T.¹ Ishikawa, Y.² Shibata, N.³

4
- 0019283390
- (1980) J. Electrochem. Soc. , vol.127 , pp. 2674
- Nishino, S.¹ Hazuki, Y.² Matsunami, H.³ Tanaka, T.⁴

5
- 0001247299
- (1991) Appl. Phys. Lett. , vol.59 , pp. 2266
- Rimai, L.¹ Ager, R.² Weber, W.H.³ Hangas, J.⁴

6
- 0028443003
- (1994) Appl. Phys. Lett. , vol.64 , pp. 3413
- Capano, M.A.¹ Walck, S.D.² Murray, P.T.³

7
- 0032074154
- (1998) Appl. Surf. Sci. , vol.127-129 , pp. 159
- Taylor, M.E.¹ Atwater, H.A.²

8
- 0032715303
- (1999) Thin Solid Film , vol.338 , pp. 93
- Wang, Y.¹ Wen, J.² Guo, Z.³ Tang, Y.⁴ Tang, H.⁵ Wu, J.⁶

9
- 0000466537
- (2001) J. Appl. Phys. , vol.89 , Issue.1 , pp. 212
- Avila, A.¹ Montero, I.² Galan, L.³ Ripalda, J.M.⁴ Levy, R.⁵

10
- 0000764553
- (1998) Appl. Phys. Lett. , vol.72 , Issue.8 , pp. 930
- Kouvetakies, J.¹ Chandrasekhar, D.² Smith, D.J.³

11
- 0000395353
- (2000) Appl. Phys. Lett. , vol.76 , Issue.17 , pp. 2373
- Kerdiles, S.¹ Berthelot, A.² Gourbilleau, F.³ Rizk, R.⁴

12
- 0001704435
- (1995) J. Appl. Phys. , vol.77 , Issue.12 , pp. 6733
- Yang, B.¹ Cai, W.² He, P.³ Sheng, Y.⁴ Jin, B.⁵ Ruan, Y.⁶ Hu, K.⁷ Huang, Y.⁸ Zhou, G.⁹

13
- 0004099866
- Gaitherburg, MD
- (1997) NIST X-ray Photoelectron Spectroscopy Database

14
- 0000448572
- (1999) J. Appl. Phys. , vol.86 , Issue.8 , pp. 4316
- Li, H.F.¹ Dimitrijev, S.² Sweatman, D.³ Harrison, H.B.⁴ Tanner, P.⁵ Feil, B.⁶

15
- 0000535314
- (1997) J. Vac. Sci. Technol. A , vol.15 , Issue.3 , pp. 1597
- Onneby, C.¹ Pantano, C.G.²

16
- 0040037376
- (1958) J. Chem. Phys. , vol.29 , pp. 1015
- Drowart, J.¹ De Maria, G.² Inghram, M.G.³

17
- 0009792821
- Dover, New York
- (1961) The Scientific Paper of J. Willard Gibbs , vol.1
- Gibbs, J.W.¹

18
- 0342378366
- (1957) J. Phys. Chem. , vol.61 , pp. 904
- Girifalco, L.A.¹ Good, R.J.²

19
- 33947475607
- (1958) J. Phys. Chem. , vol.62 , pp. 1418
- Good, R.J.¹ Girifalco, L.A.² Kraus, G.³

20
- 0004219858
- Wiley, New York
- (1972) Thermodynamics of Solids
- Swalin, R.A.¹

21
- 0001638441
- (1999) Phys. Rev. Lett. , vol.83 , Issue.8 , pp. 1624
- Di Ventra, M.¹ Pantelides, S.T.²

22
- 0003049640
- (1997) J. Vac. Sci. Technol. A , vol.15 , Issue.1 , pp. 10
- Veprek, S.¹ Kunstmann, Th.² Volm, D.³ Meyer, B.K.⁴

23
- 0017995732
- (1978) J. Vac. Sci. Technol. , vol.15 , Issue.4 , pp. 1520
- Kee, R.W.¹ Geib, K.M.² Wilmsen, W.³ Ferry, D.K.⁴

24
- 84979184865
- (1958) J. Am. Ceram. Soc. , vol.41 , pp. 347
- Ervin, G.¹

25
- 0000483059
- (1997) Phys. Rev. B , vol.56 , Issue.8 , pp. 4913
- Ma, M.¹ Ji, M.² Cai, W.³ Wu, J.⁴ Zhu, J.⁵ Liu, X.⁶ Yang, B.⁷ He, P.⁸ Jin, B.⁹ Ruan, Y.¹⁰

26
- 36549094116
- (1989) J. Appl. Phys. , vol.66 , pp. 6084
- Bermudez, V.M.¹

27
- 0000355429
- (2000) Appl. Phys. Lett. , vol.77 , Issue.10 , pp. 1437
- Jernigan, G.G.¹ Stahlbush, R.E.² Saks, N.S.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.