SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 14, Issue 11, 2002, Pages 805-809

Layer-by-layer self-assembly of reactive polyelectrolytes for robust multilayer patterning

(6) Shi, F a Dong, B a Qiu, D a Sun, J a Wu, T a Zhang, X a

a Jilin University (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BOND STRENGTH (CHEMICAL); IRRADIATION; MULTILAYERS; SELF ASSEMBLY; SOLUTIONS;

DIAZORESINS; LAYER BY LAYER SELF ASSEMBLY TECHNIQUE; MULTILAYER PATTERNING; POLYACRYLIC ACID;

POLYELECTROLYTES;

EID: 0037024375 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(20020605)14:11<805::AID-ADMA805>3.0.CO;2-O Document Type: Article

Times cited : (82)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.