Reversible photoinsertion of ferrocene into a hydrophobic semiconductor surface: A chemionic switch

Angewandte Chemie - International Edition

Volumn 41, Issue 19, 2002, Pages 3653-3656

  Muraoka, Masahiro ^a   Gillett, Stephen L ^a   Bell, Thomas W ^a  

^a UNIVERSITY OF NEVADA   (United States)

Author keywords

Metallocenes; Photochemistry; Redox chemistry; Semiconductors; Surface chemistry

Indexed keywords

IONS; OXIDATION; REDUCTION; SILANES; SOLUTIONS; TITANIUM OXIDES; ULTRAVIOLET RADIATION;

REVERSIBLE PHOTOINSERTION;

SEMICONDUCTOR MATERIALS;

FERROCENE; PROTON; TITANIUM DIOXIDE;

ARTICLE; HYDROPHOBICITY; LIGHT ABSORPTION; OXIDATION; OXIDATION REDUCTION REACTION; SEMICONDUCTOR; ULTRAVIOLET RADIATION;

EID: 0037020350     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3773(20021004)41:19<3653::AID-ANIE3653>3.0.CO;2-P     Document Type: Article

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