Low-pressure, high-current hollow cathode with a ferroelectric plasma source

Applied Physics Letters

Volumn 81, Issue 23, 2002, Pages 4341-4343

  Krokhmal, A ^a   Gleizer, J Z ^a   Krasik, Ya E ^a   Felsteiner, J ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC CURRENT MEASUREMENT; ELECTRIC POTENTIAL; ELECTRON BEAMS; FERROELECTRICITY; PLASMA DENSITY;

FERROELECTRIC PLASMA SOURCES;

PLASMA SOURCES;

EID: 0037011566     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1527695     Document Type: Article

References (7)

1. E.M. Oks and P.M. Schanin, Phys. Plasmas 6, 1649 (1999).
2. D.M. Goebel and R.M. Watkins, Rev. Sci. Instrum. 71, 388 (2000).
3. J.Z. Gleizer, A. Krokhmal, Ya.E. Krasik, and J. Felsteiner, J. Appl. Phys. 91, 3431 (2002).
4. G. Rosenman, D. Shur, Ya.E. Krasik, and A. Dunaevsky, J. Appl. Phys. 88, 6109 (2000), and references therein.
5. Ya.E. Krasik, A. Dunaevsky, and J. Felsteiner, J. Appl. Phys. 85, 7946 (1999).
6. A. Dunaevsky, Ya.E. Krasik, J. Felsteiner, and A. Sternlieb, J. Appl. Phys. 90, 3689 (2001).
7. A. Dunaevsky, Ya.E. Krasik, and J. Felsteiner, J. Appl. Phys. 91, 975 (2002).