Structural study of anodic films formed on aluminum in nitric acid electrolyte

Thin Solid Films

Volumn 416, Issue 1-2, 2002, Pages 16-23

  Yakovleva, N M ^a   Anicai, L ^b   Yakovlev, A N ^a   Dima, L ^b   Khanina, E Ya ^a   Buda, M ^c   Chupakhina, E A ^a  

^a PETROZAVODSK STATE UNIVERSITY   (Russian Federation)

^b Electrical Engineering Co   (Romania)

^c UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

Author keywords

Aluminum oxide; Anodic oxidation; Scanning electron microscopy; X ray diffraction

Indexed keywords

ANODIC OXIDATION; DISSOLUTION; ELECTRODEPOSITION; ELECTROLYTES; NITRIC ACID; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ANODIC FILMS;

AMORPHOUS FILMS;

EID: 0037009759     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00625-9     Document Type: Article

References (26)

1. Wernick S., Pinner R. Les traitements de surface et la finition de l'aluminum et des ses alliages. 1962;Ed. Eyrolles, Paris.
2. Anicai L., Meghea A., Sireah C., Dima L. Mater. Sci. Forum. 185-188:1995;489.
3. L. Anicai, Ph.D. Thesis, University of Bucharest, 1998.
4. Parhutik V.P., Makushok Iu.E., Kudriavtsev E., Sokol V.A., Khodan A.N. Electrochemistry (Elektrokhymia). 23:1987;1538.
5. Thomas S., Sherwood P.M.A. J. Chem. Soc. Faraday Trans. 89:1993;263.
6. Young L. Anodic Oxide Films. 1961;Academic Press, London.
7. Wood G.E. Oxides and Oxide Films, vol. 2. 1972;168 Marcel Dekker, New York.
8. Wooster W.A. Diffuse X-Ray Reflections from Crystals. 1962;Clarendon, Oxford.
9. Warren B.E. Kristallographya. 16:1971;1264.
10. Yakovleva N.M., Yakovlev A.N., Chupakhina E.A. Russ. J. Appl. Chem. 67:1994;1124.
11. Aleshina L.A., Malinenko V.P., Phophanov A.D., Yakovleva N.M. J. Non-Cryst. Solids. 87:1986;350.
12. Yakovleva N.M., Yakovlev A.N. Mater. Sci. Forum. 185-188:1995;293.
13. Yakovleva N.M., Yakovlev A.N., Chupakhina E.A. Thin Solid Films. 366:2000;37.
14. Odynetz L.L. Russ. J. Appl. Chem. 65:1992;2417.
15. Tajima S., Baba N., Mori T. Electrochim. Acta. 9:1964;1509.
16. Morlidge J.R., Skeldon P., Thompson G.E., Habazaki H., Shimizu K., Wood G.C. Electrochim. Acta. 44:1999;2423.
17. Hurlen T., Lian T., Odegard O.S. Electrochim. Acta. 29:1984;379.
18. Alwitt R.S. Oxides and Oxide Films, vol. 4. 1972;190 Marcel Dekker, New York.
19. Thompson G.E. Thin Solid Films. 297:1997;192.
20. Pierre A.C., Uhlman D.R. J. Non-Cryst. Solids. 82:1986;271.
21. Frankel G.S. J. Electrochem. Soc. 145:1998;2186.
22. Richardson J.A., Wood G.C. Corros. Sci. 10:1970;313.
23. Koudelkova M., Augustynski J. J. Electrochem. Soc. 126:1979;1659.
24. Terryn H., Vereecken J., Thompson G.E. Corros. Sci. 32:1991;1159.
25. Natisfan P.M., McCafferty E. J. Electrochem. Soc. 136:1989;53.
26. Sato N. Electrochim. Acta. 16:1971;1683.