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Volumn 45, Issue 11, 2002, Pages 2303-2314

Analysis of heat transfer in the rapid thermal processing of the plasma display panel

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER PROGRAM LISTINGS; COMPUTER SIMULATION; DIELECTRIC MATERIALS; FINITE VOLUME METHOD; PLASMA DISPLAY DEVICES; RADIANT HEATING; RAPID THERMAL ANNEALING; TEMPERATURE DISTRIBUTION; THERMAL STRESS;

EID: 0037007193     PISSN: 00179310     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0017-9310(01)00326-X     Document Type: Article
Times cited : (7)

References (14)
  • 4
    • 0009132061 scopus 로고
    • Temperature profile of a silicon-on-insulator multilayer structure in silicon recrystallization with incoherent light source
    • (1984) IEEE Trans. Electron Dev. ED , vol.31 , Issue.12 , pp. 1845-1851
    • Kyung, C.M.1
  • 10
    • 0009136825 scopus 로고
    • Theoretical method of determining the temperature dependence of the thermal conductivity of glasses
    • (1980) Glass Ceram , vol.37 , pp. 240-242
    • Primencho, V.I.1
  • 13
    • 0000674706 scopus 로고    scopus 로고
    • Two-dimensional combined conduction and radiation heat transfer: Comparison of the discrete ordinates method and the diffusion approximation methods
    • (2001) Numer. Heat Transfer , vol.39 , Issue.PART A , pp. 205-225
    • Lee, K.H.1    Viskanta, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.