Progress in the fabrication of high-aspect-ratio zone plates by soft X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4783, Issue , 2002, Pages 82-91

  Divan, Ralu ^a   Mancini, Derrick C ^a   Moldovan, Nicolaie ^a   Lai, Barry ^a   Assoufid, Lahsen ^a   Leonard, Quinn ^b   Cerrina, Franco ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Fresnel zone plate; Hard x rays; High aspect ratio; Soft x ray lithography

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROFORMING; ELECTRON BEAM LITHOGRAPHY; FOCUSING; GOLD; MASKS; OPTICAL MATERIALS; OPTICAL RESOLVING POWER; PHASE SHIFT; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; X RAY LITHOGRAPHY;

FRESNEL ZONE PLATE; HARD X RAYS; HIGH ASPECT RATIO; MICROFOCUSING OPTICS; SOFT X RAY LITHOGRAPHY;

X RAY OPTICS;

EID: 0036980410     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.451019     Document Type: Conference Paper

References (21)

1. B Lai, W. Yun,D. Legnini, Y. Xiao, J. Chrzas, P. Viccaro, V. White, S. Bajikar, D. Denton, F. Cerrina, E. DiFabrizio, M. Gentili, L. Grella, and M. Baciocchi, "Hard x-ray phase zone plate fabricated by lithographic techniques," Appl. Phys. Lett. 61, pp. 1877-1879, 1992.
2. S. J. Spector, C. J. Jaconsen, and D. M. Tenant, "Process optimization for production of sub-20 nm soft x-ray zone plates," J. Vac. Sci. Technol. B 15, pp. 2872-2876, 1997.
3. C. David, B. Kaulich, R. Medenwaldt, M. Hettwer, N. Fay, M. Diehl, J. Thieme, and G. Schmahl, "Low-distortion electron-beam lithography for fabrication of high-resolution germanium and tantalum zone plates," J. Vac. Sci. Technol. B 13, pp. 2762-2766, 1995.
4. E. H. Anderson, V. Boegli, and L. P. Muray, "Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures", J. Vac. Sci. Technol. B 13, pp. 2529-2534, 1995.
5. B. Nieman, D. Rudolph, G. Schmahl, "Soft x-ray imaging zone plates with large zone numbers for microscopic and spectroscopic applications," Optics Communications 12(2), pp. 160-163, 1974.
6. E. H. Anderson, D. L. Olynick, B. Harteneck, E. Veklerov, G. Denbeaux, W. Chao, A. Lucero, L. Johnson, and D. Attwood, "Nanofabrication and diffractive optics for high-resolution x-ray applications," J. Vac. Sci. Technol. B 18 (6), pp. 2970-2975, 2000.
7. M. Li, J. Wang, L. Zhang, and S. Y. Chou, "Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography," Appl. Phys. Lett. 76 (6), pp. 673-675, 2000.
8. M. Peuker, "High-efficiency nickel phase zone plates with 20 nm minimum outermost zone width," Appl. Phys. Lett. 78 (15), pp. 2208-2210, 2001.
9. C. David, B. Nhammer, H. Solak, B. Haas, F. Glaus, .J. Friso van der Veen, V. Schlott, J. Bongaerts, B. Kaulich, J. Susini, "Diffractive lenses for photon energies ranging from the extreme ultraviolet to hard x-rays," Proc. SPIE Vol. 4499, pp. 85-95, 2001.
10. W. Yun, B. Lai, Z. Cai, J. Maser, D. Legnini, E. Gluskin, Z. Chen, A. A. Krasnoperova, Y. Vladimirski, F. Cerrina, E. Di Fabrizio, and M. Gentili, "Nanometer focusing of hard x rays by phase zone plates," Rev. Sci. Instrum. 70 (5), pp.2238-2241, 1999.
11. M. Panitz, G. Schneider, M. Peuker, D. Hambach, B. Kaulich, S. Oestereich, J. Susini, and G. Schmahl, "Electroplated gold zone plates as x-ray objectives for photon energies of 2-8 keV," X-Ray Microscopy: Proceedings of the Sixth International Conference, edited by W. Meyer-Ilse, T. Warwick, and D. Atwood (American Institute of Physics, Melville, NY, 2000), p. 676.
12. E. Di Fabrizio, F. Romanato, M. Gentili, "Toward high resolution and high efficiency zone plate for x-ray applications", X-Ray Microscopy: Proceedings of the Sixth International Conference, edited by W. Meyer-Ilse, T. Warwick, and D. Atwood (American Institute of Physics, Melville, NY, 2000), p. 635.
13. C. David, B. Kaulich, R. Barrett, M. Salom, and J. Susini, "High-resolution lenses for sub-100 nm x-ray fluorescence microscopy," Appl. Phys. Lett. 77 (23), pp. 3851-3853, 2000.
14. J. Kirz, "Phase zone plates for x rays and the extreme uv," J. Opt. Soc. Am., 64(3), pp. 301-309, 1974.
15. T. Tanaka, M. Morigami, H. Oizumi, T. Ogawa, and S.Uchino, "Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process," Jpn.J.Appl.Phys. 33, pp. L1803-L1805, 1994.
16. H. Oizumi, Y. Yamashita, T. Ogawa, T. Soga, and R. Yamanaka, "X-ray lithography with a wet-silylated and dry-developed resist," Jpn.J.Appl.Phys. 35, pp. 6734-6737, 1995.
17. Z. Chen, Y. Vladimirski, F. Cerrina, B. Lai, W. Yun, and E. Gluskin, "0.1 μm High Aspect Ratio Pattern Replication and Linewidth Control," Proc. SPIE Vol. 3331, pp. 591-600, 1998.
18. G. M. Wells, B. Lai, D. So, R. Redaelli, and F. Cerrina, "X-ray lithography beamlines at Aladdin," Nucl. Instrum. Methods A 266, pp. 278-286, 1988.
19. V. Ghica, and W. Glashauser, German Patent No. 3039110, 1982; "Method of stress-free development of irradiated polymethylmetacrylate," U.S. Patent No. 4393129, 1983.
20. Y. Vladimirisky, O. Vladimirisky, K.J. Morris, J. M. Klopf, G. M. Calderon, V. Saile, "PMMA as an x-ray resist for micro-machining application: latent image formation and thickness losses," Microelectronic Engineering 30, pp. 543-546, 1996.
21. J. N. Helbert, "Process for improving adhesion of resist to gold," U.S. Patent No. 4,497,890 1985.