Hydrogen incorporation in Ni-P films prepared by electroless deposition

Journal of Applied Electrochemistry

Volumn 32, Issue 12, 2002, Pages 1331-1336

  Saaoudi, M ^a,b   Chassaing, E ^b   Cherkaoui, M ^a   Ebntouhami, M ^a  

^a IBN TOFAIL UNIVERSITY   (Morocco)

^b CNRS   (France)

Author keywords

Electroless deposition kinetics; Hydrogen incorporation; Ni P films; Quartz crystal microbalance

Indexed keywords

CATHODES; CYCLIC VOLTAMMETRY; DISSOLUTION; ELECTROLESS PLATING; HYDROGEN; NICKEL COMPOUNDS; OXIDATION; PH EFFECTS; PROTONS; REACTION KINETICS; SOLVENTS; THERMOGRAVIMETRIC ANALYSIS;

ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; ELECTROLESS DEPOSITION KINETICS; HYDROGEN INCORPORATION; NICKEL PHOSPHORUS FILMS; PARASITIC REACTIONS;

METALLIC FILMS;

EID: 0036965974     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1022691218053     Document Type: Article

References (28)

1. U. Hofmann and K.G. Weil, Dechema-Monographien 121 (1990) 257.
2. M. Benje, U. Hofmann, U. Pitterman and K.G. Weil, Ber. Bunsenges. Phys. Chem. 92 (1988) 1257.
3. W. Riedel, Galvanotechnik 81(3) (1990) 842.
4. G.O. Mallory and V.A. Loyd, Plat. Surf. Finish. 72 (1985) 52.
5. T. Kobayashi, J. Ishibashi, S. Mononobe, M. Ohtsu and H. Honma, J. Electrochem. Soc. 147 (2000) 1046.
6. Chun-Jen Chen and Kwang-Lung Lin, J. Electrochem. Soc. 146 (1999) 137.
7. M. Cherkaoui, A. Srhiri and E. Chassaing, Plat. Surf. Finish. 79 (1992) 68.
8. M. Ebntouhami, M. Cherkaoui, A. Srhiri, A. Benbachir and E. Chassaing, J. Appl. Electrochem. 26 (1996) 487.
9. M. Ebntouhami, E. Chassaing and M. Cherkaoui, Electrochim. Acta 43 (1998) 1721.
10. J. Chitty, A. Pertuz, H. Hintermann, M.H. Staia and E.S. Puchi. Thin Solid Films 308-309 (1997) 430.
11. R.L. Zeller III and U. Landau, J. Electrochem. Soc. 137 (1990) 1107.
12. J.J. Kelly, K.M.A. Rahman, C.J. Durning and A.C. West. J. Electrochem. Soc. 145 (1998) 492.
13. M. Saaoudi, M. Ebntouhami, M. Cherkaoui, A. Srhiri, A. Ben Bachir, M. Elhark and A. Tanji, French patent 2 754 831 (1998).
14. I. Bakonyi, A. Cziraki, I. Nagy and M. Hosso, Z. Metallkunde 77 (1986) 425.
15. K-H. Hur, J. Mat Sci. 25 (1990) 2573.
16. J-P. Bonino, S. Bruet-Hotellaz, C. Bories, P. Pouderoux and A. Rousset, J. Appl. Electrochem. 27 (1997) 1193.
17. C. Gabrielli and F. Raulin, J. Appl. Electrochem. 1 (1971) 167.
18. J. Crousier, Z. Hanane and J-P. Crousier, Thin Solid Films 248 (1994) 51.
19. R. Stevanovic, J. Stevanovic and A. Despic, J. Appl. Electrochem. 29 (1999) 747.
20. J. Crousier, Z. Hanane and J-P. Crousier, Electrochim. Acta 38 (1993) 261.
21. L.M. Abrantes, M.C. Oliveira, J.P. Bellier and J. Lecoeur, Electrochim. Acta 39 (1994) 1915.
22. I. Ohno, Mater. Sci. Eng. A146 (1991) 33.
23. L.M. Abrantes and J.P. Correia, J. Electrochem. Soc. 141 (1994) 2356.
24. L.M. Abrantes, M.C. Oliveira and E. Vieil, Electrochim. Acta 41 (1996) 1515.
25. L.M. Abrantes and M.C. Oliveira, J. Electrochem. Soc. 147 (2000) 2981.
26. L.V. Sastri, R.E. Huie and P. Neta, J. Phys. Chem. 94 (1990) 1895.
27. E. Chassaing, M. Joussellin and R. Wiart, J. Electroanal. Chem. 157 (1983) 75.
28. A. Brenner, 'Electrodeposition of Alloys', Vol. 1-2 (Academic Press, New York 1963).