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Volumn 5, Issue 4-5 SPEC., 2002, Pages 457-464
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Physical failure analysis in semiconductor industry - Challenges of the copper interconnect process
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Author keywords
Defect analysis; Failure localization; Physical failure analysis; Process monitoring
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Indexed keywords
COPPER;
CRYSTAL DEFECTS;
CRYSTAL MICROSTRUCTURE;
FAILURE ANALYSIS;
INTERCONNECTION NETWORKS;
SCANNING ELECTRON MICROSCOPY;
TOMOGRAPHY;
TRANSMISSION ELECTRON MICROSCOPY;
INTERCONNECT PROCESSES;
PHYSICAL FAILURE ANALYSIS;
SEMICONDUCTOR MATERIALS;
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EID: 0036962353
PISSN: 13698001
EISSN: None
Source Type: Journal
DOI: 10.1016/S1369-8001(02)00124-5 Document Type: Conference Paper |
Times cited : (18)
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References (13)
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