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Volumn 5, Issue 4-5 SPEC., 2002, Pages 457-464

Physical failure analysis in semiconductor industry - Challenges of the copper interconnect process

Author keywords

Defect analysis; Failure localization; Physical failure analysis; Process monitoring

Indexed keywords

COPPER; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; FAILURE ANALYSIS; INTERCONNECTION NETWORKS; SCANNING ELECTRON MICROSCOPY; TOMOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036962353     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00124-5     Document Type: Conference Paper
Times cited : (18)

References (13)
  • 7
    • 0000257216 scopus 로고    scopus 로고
    • International conference on characterization and metrology for ULSI technology
    • Engelmann HJ, Zschech E. International Conference on Characterization and Metrology for ULSI Technology. AIP Conf Proc (Amer Inst Phys) 2000;550:491-9.
    • (2000) AIP Conf Proc (Amer Inst Phys) , vol.550 , pp. 491-499
    • Engelmann, H.J.1    Zschech, E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.