The growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 407-412

  Kim, H ^a   Cabral Jr , C ^a   Lavoie, C ^a   Rossnagel, S M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ASPECT RATIO; DEPOSITION; DIFFUSION; FILM GROWTH; LIGHT SCATTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; TANTALUM; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIER PROPERTIES; ELASTIC LIGHT SCATTERING; PLASMA ENHANCED ATOMIC LAYER DEPOSITION;

THIN FILMS;

EID: 0036950346     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b8.5     Document Type: Conference Paper

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