Effect of impurity levels on precipitation behavior in the low-activation V-4Cr-4Ti alloys

Journal of Nuclear Materials

Volumn 307-311, Issue 1 SUPPL., 2002, Pages 620-624

  Heo, N J ^a   Nagasaka, T ^b   Muroga, T ^b   Matsui, H ^c  

^a GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^b NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HARDNESS; IMPURITIES; MICROSTRUCTURE; PRECIPITATION (CHEMICAL);

LOW ACTIVATION ALLOYS;

VANADIUM ALLOYS;

EID: 0036942165     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(02)01040-1     Document Type: Article

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