Microstructural evolution of nickel induced crystallization of amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 217-222

  Park, Kyu Ho ^b   Jeong, Young Woo ^b   Kwon, Hyun Ja ^b   Lee, Jeong Soo ^b   Kim, Binn ^a   Kim, Hae Yeol ^a   Seo, Hyun Sik ^a  

^a LG Display Co Ltd   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COATINGS; CRYSTALLIZATION; GRAIN GROWTH; MORPHOLOGY; NICKEL; NICKEL COMPOUNDS; NUCLEATION; PHASE TRANSITIONS; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY;

NICKEL SILICIDE; PRECIPITATES;

AMORPHOUS SILICON;

EID: 0036920123     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a22.6     Document Type: Conference Paper

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