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Volumn , Issue , 2002, Pages 421-424

Plasma treatment as a method of In-plane liquid crystal alignment

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; CURRENT DENSITY; ELECTRIC POTENTIAL; IRRADIATION; LIGHT POLARIZATION; OPTICAL COLLIMATORS; SUBSTRATES; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

EID: 0036905407     PISSN: 10831312     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (8)

References (15)
  • 2
    • 0025555494 scopus 로고
    • Y. Nano et al., Proc. SID, 31, No4, 295 (1990).
    • (1990) Proc. SID , vol.31 , Issue.4 , pp. 295
    • Nano, Y.1
  • 3
    • 0033733406 scopus 로고    scopus 로고
    • M. Hasegawa, Jpn.J.Appl.Phys., 39, Part 1, No. 3A, 1272 (2000).
    • (2000) Jpn.J.Appl.Phys. , vol.39 , Issue.3 PART 1 A , pp. 1272
    • Hasegawa, M.1
  • 7
    • 0012068166 scopus 로고    scopus 로고
    • US patent 5,710,608
    • Nakabayashi et al., US patent 5,710,608.
    • Nakabayashi1
  • 8
    • 0012070174 scopus 로고    scopus 로고
    • US patent 6,313,896
    • M. Samant et al., US patent 6,313,896.
    • Samant, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.